Dual target sputtering system J20

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隐藏域元素占位

Classification:

SuPro

Features

● Low temperature magnetron sputtering technology;

● Dual-target design, no need to change targets, gold-platinum dual targets can be stacked or sputtered separately;

● Automatic sample rotating table, more uniform sputtering;

● Menu storage, automatic one-touch operation.

parameter

principle	Magnetron sputtering principle, sputtering at room temperature, no thermal damage
Vacuum system	Vacuum chamber φ135*120mm (inner diameter), equipped with rotary vane vacuum pump (can be upgraded to oil-free dry pump), ultimate vacuum <1Pa, working pressure 4-10Pa can be controlled by constant pressure, Pirani vacuum gauge
Sputtering target source	Target size φ30*0.2mm/2 pieces, capable of single target sputtering, dual target co-sputtering, dual target alternating sputtering
Automatic digital display sample stage	φ75mm deflectable digital display planetary sample stage, rotation speed 0~60RPM adjustable, deflection angle 0~40° adjustable
Sputtering power supply	Constant power magnetic controlled DC power supply Max.20W, Max.100mA, 0-800V DC
How it works	Touch screen control, the control system provides interlock protection function
quality assurance	One year