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Ion sputtering Instrument ISC150

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Ion sputtering Instrument ISC150

Classification:

SuPro

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  • Detail

    ● Low temperature magnetron sputtering technology;

    ● Fast pumping speed, fine film, small particles;

    ● Menu storage, automatic one-touch operation.

     

    Vacuum Pump

    Rotary vane mechanical pump, upgradeable to oil-free dry pump

    Ultimate vacuum

    ＜1 Pa

    Working air pressure

    5-10Pa, constant pressure control possible

    Working gas

    Air

    Vacuuming time

    ＜2min

    Vacuum gauge

    Imported brand Pirani vacuum gauge

    Sample chamber size

    φ150*120mm

    Sputtering principle

    Magnetron sputtering

    Sputtering source

    Target size φ50*0.1-2mm (recommended thickness＞0.2mm)

    Sputtering power supply

    Constant power magnetron DC sputtering power supply Max 20W, Max 100mA

    Sputtering time

    Programmable control (0-300 s)

    Sample stage

    Adjustable speed rotating sample stage (0-60 rpm), deflection angle -40° to +40°, revolution + planetary rotation mode

    How it works

    Touch screen control

    quality assurance

    One year free/lifetime maintenance

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