Sputter coater ISC150T

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隐藏域元素占位

Classification:

SuPro

● Fully oil-free high vacuum pump system;

● Constant power magnetron sputtering deposition, constant deposition rate;

● Low working pressure, fine deposited film;

● Room temperature deposition, no damage to the sample due to temperature rise or ion bombardment.

Vacuum pump set	International first-line brand oil-free dry pump + molecular pump set
Pumping speed	>0.7 m3/h diaphragm pump + 60 L/S molecular pump
Ultimate vacuum	<10E-4 Pa
Working air pressure	0.5-2 Pa
Vacuuming time	<5 min
Vacuum gauge	Imported brand Pirani vacuum gauge
Gas Control	MFC flow controller (50sccm Ar)
Chamber size	Ф150×110mm Quartz glass
Magnetron sputtering source	Target size Ф 50 × 0.1～3 mm (recommended thickness>0.2 mm)/with manual baffle, can sputter precious metals Au, Pt, Pd, etc., can also sputter Cr, W, Ag, C and other materials (with Ar gas)
Magnetron sputtering power supply	Constant power magnetron DC sputtering power supply Max. 30W, Max. 100 mA
How it works	Touch screen control
Sample stage	Adjustable speed rotating sample stage (0-60 rpm), deflection angle -40° to +40°, revolution + planetary rotation mode
Weight and size	~30kg/480mm wide385mm deep430mm high