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SEM in-situ plasma cleaning source RPS50

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SEM in-situ plasma cleaning source RPS50

Classification:

SuPro

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  • Detail

    ● Remote plasma cleaning, gentle energy, no damage to the SEM scanning electron microscope and probe;

    ● Plug and play, easy to operate;

    ● Effectively extend the service life of SEM, improve SEM imaging resolution and contrast, and shorten the vacuum pumping time.

     

    Mounting flange

    KF40 or KF25

    Working air pressure

    0.5-5Pa

    RF Power

    5-50W RF power, constant power control, manual matching

    Gas Control

    One-way MFC gas mass flow controller (50SCCM N2)

    Ion cleaning source working gas

    Air or conventional gas (such as Ar, O2, H2, etc.)

    How it works

    Touch screen control

    power supply

    AC, 50/60Hz 110-220V grounded three-pin plug

    Power consumption

    ＜300W

    Cooling method

    Air Cooling

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