Ion sputtering Instrument MS150/IS150

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隐藏域元素占位

Classification:

LEBO science

Features

● Humanized design, simple instrument operation, one-button coating;

● The instrument is compact and does not take up space, making it suitable for laboratories, research institutes, etc.;

● The coating is uniform and fine, suitable for a variety of target materials;

● The sample stage can be quickly adjusted to facilitate the placement and removal of samples;

● Achieve better lamination with less power and reduce heat.

parameter

	IS150	MS150
Cavity size	Quartz glass, diameter 150mm*height 130mm	Quartz glass, diameter 150mm*height 130mm
Power supply specifications	AC220V,200W	AC220V,200W
Sputtering voltage	MAX 2500V	MAX 500V
Sputtering current	MAX 30mA	MAX 60mA
Target size	Diameter 57mm, thickness 0.1-0.5mm	Diameter 57mm*0.1mm
Applicable target material	Precious metals Au Au-Pt Au-Pd Pt Pt-Pd Common metals Cu W Ag Cr etc.	Precious metals Au Pt Pd, alloys Au-Pd Pt-Pd Common metals Cu W Ag Cr etc.
Sample stage with adjustable height	20-50mm	20-50mm
Sample stage size	Diameter 55mm	Diameter 65mm
Working vacuum	1-20 Pa	1-10Pa
Gas circuit number	Single channel	Single channel